Vistec Electron Beam

Vistec Electron Beam GmbH is a German worldwide operating manufacturer of electron-beam lithography systems. These systems are used in semiconductor industry, in micro- and nano optics and in Advanced Research for various applications various applications in micro – and nano-patterning. Vistec's lithography systems are based on the Variable Shaped Beam (VSB) principle, in which resist patterning on a substrate (also referred to as exposure or writing) is performed using an electron-beam of variable shape and size with homogeneous intensity distribution.

History: The company's roots go back to Carl Zeiss Jena in Jena in the early 1970s, when the first commercial electron beam exposure system based on the VSB principle was introduced. The main customers for the so-called ZBAs (Zeiss exposure system) were the former RGW countries. After the political changes in Germany, electron beam lithography was initially continued under the roofs of Jenoptik and later Leica Microsystems. Since 1996, Electron Beam Lithography has been operating as a limited liability company (GmbH), since 2006 under the name Vistec Electron Beam GmbH. Since 2012 Vistec Electron Beam GmbH is a wholly owned subsidiary of DR.-JOHANNES-HEIDENHAIN GmbH. The company employs more than 110 people worldwide. In addition to the headquarters in Jena, the company operates service and support centers in Asia, in the USA and in Europe.

References

https://www.vistec-semi.com ISBN 978-3939718802, Electron Beam Lithography Contributions from Jena by Peter Hahmann https://en.wikipedia.org/wiki/Silicon_Saxony

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